The First and Only In-Situ Ion Implant Cleaning Process Delivering a More Predictable Process and Extended Source Life.
The ATMI AutoClean System is an award winning, breakthrough in Ion Implanter operational efficiency that saves time and money by dramatically increasing ion source life and time between preventative maintenance. As a winner of the 2008 R&D 100 Award, the system is comprised of a cleaning reagent, a process recipe, a solid source delivery mechanism and a customer-specific application development capability.
The in-situ AutoClean process chemically - and automatically - removes deposits from the ion source and extraction regions of the implanter, dramatically reducing human exposure to hazardous process by-products. Cleaning occurs in-situ and reduces downtime events that arise due to beam glitching, extraction arcing and beam uniformity failures. Moreover, the ATMI AutoClean System reduces cross contamination which minimizes the need for mandatory species rotation. This improves the overall flexibility of the fab and its ability to adjust quickly to desired changes.
The AutoClean System runs as a normal recipe for cleaning the source region or as a conditioning recipe for pre- or post- implant operations. Gain process efficiency in your implant operations with the AutoClean System.
In Our Customer's Words
"AutoClean operation resulted in consistent source performance with zero unscheduled downtime caused by early source failure. In side-by-side testing, the AutoClean system experienced 25-30% fewer source changes than the standard system. Data shows clearly that the AutoClean process significantly reduced the glitch rate as the source ages, producing glitch rates at the end of source life that are comparable to new source performance. Enhanced Safety with reduction in personnel exposure to hazardous materials & process byproducts = parts were cleaner and required less scrubbing during PMs. Throughput modeling estimates approximately 2000 wafers per tool in increased wafer output."
— Texas Instruments, DMOSS6
"Our initial testing demonstrated the outstanding cleaning properties of ATMI's AutoClean system. Regular periodic use of AutoClean for in-situ cleaning of the ion source resulted in a 40% - 50% increase in source life. It also improved fab predictability and productivity by eliminating ion source failures due to beam instability and high suppression leakage current. In addition, based on our initial data, our regular preventative maintenance activities will be easier and require less tool downtime as a result of using AutoClean."
— Jim Dunn, Implant Equipment Engineering Section Manager, Atmel, Colorado Springs, CO