Deposition Precursor Materials
ATMI delivers process efficiency solutions for deposition by providing Ultrapur™ deposition precursors for CVD and ALD, patented canisters to safely handle and transport materials and state-of-the-art equipment. ATMI offers deposition precursors for both front end and back end applications. Advanced applications are accelerated and optimized using ATMI's unique and exclusive High Productivity Development capabilities. Key advanced applications include high-k dielectrics and advanced metal gate electrodes for capacitors in DRAM, high-k / metal gates for Logic and advanced dielectrics for Shallow Trench Isolation, spacer and hard mask applications requiring low temperature deposition and tunable etch performance.
Deposition precursors can be delivered as gases using the unique and safe SAGE™ technology developed by ATMI. Liquids using the Unichem™ family of liquid delivery systems incorporate flowing purge technology to maintain ultra-high purity and solids using the ProE-Vap system with stable mass flux performance and efficient use of the delivered materials. These capabilities add value to customers and, when combined, create true process efficiency to enhance process performance, improve manufacturing yields and reduce process tool downtime and cost per wafer.
Deposition Support Equipment
Deposition precursors need to be packaged and delivered correctly in order to deliver the full potential value. ATMI provides optimized equipment to support the overall deposition process and ensure the quality of the deposited films is pure and consistent. ATMI provides gas packaging and delivery, liquid canisters and delivery and solid delivery solutions that maximize the efficient use of your materials, reduces process tool downtime and capital investment by increasing operational flexibility while improving process stability. The combination of the deposition support equipment and precursor materials from ATMI results in a highly efficient process solution for semiconductor manufacturing.
Deposition Precursor Materials
High-k Dielectrics High-k
Capacitors
Low-k Dielectrics
STI Gapfill
Dielectrics
Barriers
Electrodes
Copper
FeRAM
PRAM
Metal Gate Electrodes
Deposition Support Equipment
Liquid - Unichem and Bulkfill
Solid - ProE-Vap
Gas - SAGE